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The original landmark paper on automated OPC we presented at the SPIE Microlithography Symposium in March 1994: Automated optical proximity correction--a rules-based approach.

Presented at the SPIE Microlithography Symposium in March 1995: Integrating proximity effects corrections with photomask data preparation. The paper explains in detail the features of OPRX that allow it to integrate seamlessly into your manufacturing data flow.

Presented at the 15th Annual BACUS Symposium on Photomask Technology and Management in September 1995: Simplified Rule Generation for Automated Rules-Based Optical Enhancement. The paper demonstrates the Parametric Anchoring methodology with actual process measurements.

Presented at the 16th Annual BACUS Symposium on Photomask Technology and Management in September 1996: Advances in Process Matching for Rules-Based Optical Proximity Correction. The paper shows more recent results in matching to customer processes.